Double - patterning friendly grid-based routing with online conflict resolution /
Islam Shaker Abdullah Abed
Double - patterning friendly grid-based routing with online conflict resolution / الطباعة المزدوجه الصديقة للتوجيه الشبكى مع الحل الفورى للتعارضات Islam Shaker Abdullah Abed ; Supervised Elsayed E. Hemayed , Amr G. Wassal - Cairo : Islam Shaker Abdullah Abed , 2013 - 74 P. : charts , facsimiles ; 30cm
Thesis (M.Sc.) - Cairo University - Faculty of Engineering - Department of Computer Engineering
Double patterning lithography (DPL) is seen as one of the most promising solutions for new technology nodes such as 32nm and 22nm . However DPL faces the challenges of handling conflicts in layout decomposition and overlay errors . Currently most DPL solutions use post-layout decomposition that requires multiple iterations and designer intervention to achieve a decomposable layout as designs scale larger
Detailed routing Double patterning lithography Grid- based
Double - patterning friendly grid-based routing with online conflict resolution / الطباعة المزدوجه الصديقة للتوجيه الشبكى مع الحل الفورى للتعارضات Islam Shaker Abdullah Abed ; Supervised Elsayed E. Hemayed , Amr G. Wassal - Cairo : Islam Shaker Abdullah Abed , 2013 - 74 P. : charts , facsimiles ; 30cm
Thesis (M.Sc.) - Cairo University - Faculty of Engineering - Department of Computer Engineering
Double patterning lithography (DPL) is seen as one of the most promising solutions for new technology nodes such as 32nm and 22nm . However DPL faces the challenges of handling conflicts in layout decomposition and overlay errors . Currently most DPL solutions use post-layout decomposition that requires multiple iterations and designer intervention to achieve a decomposable layout as designs scale larger
Detailed routing Double patterning lithography Grid- based