The effect of the growth condition on the structure and the physical properties of Gd- Doped Ti Co ferrite thin films via pulsed laser deposition (PLD) /
Aya Ali Abdallah Elamy
The effect of the growth condition on the structure and the physical properties of Gd- Doped Ti Co ferrite thin films via pulsed laser deposition (PLD) / PLD تأثير ظروف النمو على التركيب والخصائص الفيزيائية لمادة جادولنيوم المطعم بالتيتانيوم كوبلت فريت أفلام رقيقة بواسطة تقنية الترسيب النبضي الليزري Aya Ali Abdallah Elamy ; Supervised Mohamed A. Khedr, Hisham M. Imam , Mohamed A. Hafez - Cairo : Aya Ali Abdallah Elamy , 2017 - 149 P. : charts , facsimiles ; 25cm
Thesis (M.Sc.) - Cairo University - National Institute of Laser Enhanced Sciences - Department of Laser Application in Environmental Metrology photochemistry and Agriculture
Thesis focuses on Pulsed Laser Deposition (PLD) system, fabrication of Gd- doped Ti Co ferrite thin films and their characterization. The thin films were characterized in details by employing structural X- Ray Diffraction (XRD), Raman spectroscopy and Vibrating Sample Magnetometer (VSM) measurements. Firstly, Gd-doped Ti Co ferrite powder was fabricated by the standard ceramic technique followed by studying of the structure and magnetic properties. XRD and Raman spectroscopy confirmed the polycrystalline structure of two phases, which are cubic inverse spinel and perovskite structures, with the appearance of the secondary phase. VSM measurement indicated that the hysteresis loop has soft magnetic behavior. The prepared powder was then pressed in the form of a pellet to be used as a target for preparing thin films by PLD. Secondly, Gd-doped Ti Co ferrite thin films were then prepared by PLD on two different substrates (Si (100) and quartz) at two deposition times (30 min and 120 min) under the following conditions: Nd: YAG laser with 1064 nm, 6 ns pulse duration, 10 Hz repetition rate, at pressure 210-6 Torr and distance between target and substrate was held at 4 cm. Then, these thin films were annealed at different temperatures (500 C, 700 C and 900 C). Average thicknesses of these thin films were ~ 126 nm and ~ 515 nm at deposition times 30 min and 120 min, respectively. These thin films were characterized by XRD, Raman, and VSM
Pulsed Laser Deposition (PLD) Thin films X- Ray Diffraction (XRD)
The effect of the growth condition on the structure and the physical properties of Gd- Doped Ti Co ferrite thin films via pulsed laser deposition (PLD) / PLD تأثير ظروف النمو على التركيب والخصائص الفيزيائية لمادة جادولنيوم المطعم بالتيتانيوم كوبلت فريت أفلام رقيقة بواسطة تقنية الترسيب النبضي الليزري Aya Ali Abdallah Elamy ; Supervised Mohamed A. Khedr, Hisham M. Imam , Mohamed A. Hafez - Cairo : Aya Ali Abdallah Elamy , 2017 - 149 P. : charts , facsimiles ; 25cm
Thesis (M.Sc.) - Cairo University - National Institute of Laser Enhanced Sciences - Department of Laser Application in Environmental Metrology photochemistry and Agriculture
Thesis focuses on Pulsed Laser Deposition (PLD) system, fabrication of Gd- doped Ti Co ferrite thin films and their characterization. The thin films were characterized in details by employing structural X- Ray Diffraction (XRD), Raman spectroscopy and Vibrating Sample Magnetometer (VSM) measurements. Firstly, Gd-doped Ti Co ferrite powder was fabricated by the standard ceramic technique followed by studying of the structure and magnetic properties. XRD and Raman spectroscopy confirmed the polycrystalline structure of two phases, which are cubic inverse spinel and perovskite structures, with the appearance of the secondary phase. VSM measurement indicated that the hysteresis loop has soft magnetic behavior. The prepared powder was then pressed in the form of a pellet to be used as a target for preparing thin films by PLD. Secondly, Gd-doped Ti Co ferrite thin films were then prepared by PLD on two different substrates (Si (100) and quartz) at two deposition times (30 min and 120 min) under the following conditions: Nd: YAG laser with 1064 nm, 6 ns pulse duration, 10 Hz repetition rate, at pressure 210-6 Torr and distance between target and substrate was held at 4 cm. Then, these thin films were annealed at different temperatures (500 C, 700 C and 900 C). Average thicknesses of these thin films were ~ 126 nm and ~ 515 nm at deposition times 30 min and 120 min, respectively. These thin films were characterized by XRD, Raman, and VSM
Pulsed Laser Deposition (PLD) Thin films X- Ray Diffraction (XRD)