EUV (13.5nm) versus DUV (139nm) lithography techniques / Ahmed Mohamed Sami Mohamed Hassan Khalil ; Supervised Amin Mohamed Nassar

By:

Ahmed Mohamed Sami Mohamed Hassan Khalil

Contributor(s):

Amin Mohamed Nassar []

Material type: Text

TextLanguage: English Publication details: Cairo : Ahmed Mohamed Sami Mohamed Hassan Khalil , 2012Description: 87 P. : charts , facsimiles ; 30cmOther title:

تكنولوجيا تصنيع الدوائر المتكاملة بستخدام الاشعة الفوق بنفسجية [Added title page title]

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Issued also as CD

Dissertation note: Thesis (M.Sc.) - Cairo University - Faculty of Engineering - Department of Electronics and Communication Summary: This thesis contains an overview of the deep - ultraviolet (DUV) 193 nm lithography the basic concepts of extreme - ultraviolet (EUV) lithography systems and the capabilities and challenges of EUVL and explains how EUVL might be implemented . It provides a description of the black boxes inside the correction flow implemented in calibre simulation tool and a comparison between the reults of the two systems

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Item type	Current library	Home library	Call number	Copy number	Status	Barcode
Thesis	قاعة الرسائل الجامعية - الدور الاول	المكتبة المركزبة الجديدة - جامعة القاهرة	Cai01.13.08.M.Sc.2012.Ah.E (Browse shelf(Opens below))		Not for loan	01010110057797000
CD - Rom	مخـــزن الرســائل الجـــامعية - البدروم	المكتبة المركزبة الجديدة - جامعة القاهرة	Cai01.13.08.M.Sc.2012.Ah.E (Browse shelf(Opens below))	57797.CD	Not for loan	01020110057797000

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Previous	Cai01.13.08.M.Sc.2012.Ab.P Performance analysis of TDMA relay protocols over Weibull and Weibull-Lognormal fading channels /	Cai01.13.08.M.Sc.2012.Ah.C Comparison and enhancement of lossy image compression techniques /	Cai01.13.08.M.Sc.2012.Ah.C Comparison and enhancement of lossy image compression techniques /	Cai01.13.08.M.Sc.2012.Ah.E EUV (13.5nm) versus DUV (139nm) lithography techniques /	Cai01.13.08.M.Sc.2012.Ah.E EUV (13.5nm) versus DUV (139nm) lithography techniques /	Cai01.13.08.M.Sc.2012.Ah.F A fast algorithm for vision aided inertial navigation /	Cai01.13.08.M.Sc.2012.Ah.F A fast algorithm for vision aided inertial navigation /	Next

Thesis (M.Sc.) - Cairo University - Faculty of Engineering - Department of Electronics and Communication

This thesis contains an overview of the deep - ultraviolet (DUV) 193 nm lithography the basic concepts of extreme - ultraviolet (EUV) lithography systems and the capabilities and challenges of EUVL and explains how EUVL might be implemented . It provides a description of the black boxes inside the correction flow implemented in calibre simulation tool and a comparison between the reults of the two systems

Issued also as CD

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