Resolution enhancements techniques for the 45nm node and beyond / Ahmed Elsayed Salem Farag Omran ; Supervised Ahmed Hussien Khalil , Hossam A. H. Fahmy , Jochen Schacht
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- أساليب تحسين الدقة في تقنية ٤٥ نانومتر و مابعدها [Added title page title]
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قاعة الرسائل الجامعية - الدور الاول | المكتبة المركزبة الجديدة - جامعة القاهرة | Cai01.13.08.M.Sc.2012.Ah.R (Browse shelf(Opens below)) | Not for loan | 01010110059455000 | ||
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مخـــزن الرســائل الجـــامعية - البدروم | المكتبة المركزبة الجديدة - جامعة القاهرة | Cai01.13.08.M.Sc.2012.Ah.R (Browse shelf(Opens below)) | 59455.CD | Not for loan | 01020110059455000 |
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Cai01.13.08.M.Sc.2012.Ah.I Interference management via exploiting cooperation in wireless communication networks / | Cai01.13.08.M.Sc.2012.Ah.R Resource reservation scheduling and reclaiming algorithms in multiprocessor real-time systems / | Cai01.13.08.M.Sc.2012.Ah.R Resource reservation scheduling and reclaiming algorithms in multiprocessor real-time systems / | Cai01.13.08.M.Sc.2012.Ah.R Resolution enhancements techniques for the 45nm node and beyond / | Cai01.13.08.M.Sc.2012.Ah.R Resolution enhancements techniques for the 45nm node and beyond / | Cai01.13.08.M.Sc.2012.Al.S Session Initiation Protocol ( SIP ) signaling in modern Networks / | Cai01.13.08.M.Sc.2012.Al.S Session Initiation Protocol ( SIP ) signaling in modern Networks / |
Thesis (M.Sc.) - Cairo University - Faculty of Engineering - Department of Electronics and Communication
Semiconductor manufacturing is continuously ramping up the yield of technology processes with transistor dimensions well below the exposure wave length. Light diffraction prevents printing wafer patterns identical to the shapes drawn on the mask. Resolution Enhancements Techniques (RET) are enabling these technologies to manufacture
Issued also as CD
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