Double - patterning friendly grid-based routing with online conflict resolution / Islam Shaker Abdullah Abed ; Supervised Elsayed E. Hemayed , Amr G. Wassal

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Islam Shaker Abdullah Abed

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Material type: Text

TextLanguage: English Publication details: Cairo : Islam Shaker Abdullah Abed , 2013Description: 74 P. : charts , facsimiles ; 30cmOther title:

الطباعة المزدوجه الصديقة للتوجيه الشبكى مع الحل الفورى للتعارضات [Added title page title]

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Dissertation note: Thesis (M.Sc.) - Cairo University - Faculty of Engineering - Department of Computer Engineering Summary: Double patterning lithography (DPL) is seen as one of the most promising solutions for new technology nodes such as 32nm and 22nm . However DPL faces the challenges of handling conflicts in layout decomposition and overlay errors . Currently most DPL solutions use post-layout decomposition that requires multiple iterations and designer intervention to achieve a decomposable layout as designs scale larger

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Item type	Current library	Home library	Call number	Copy number	Status	Date due	Barcode
Thesis	قاعة الرسائل الجامعية - الدور الاول	المكتبة المركزبة الجديدة - جامعة القاهرة	Cai01.13.06.M.Sc.2013.Is.D (Browse shelf(Opens below))		Not for loan		01010110061021000
CD - Rom	مخـــزن الرســائل الجـــامعية - البدروم	المكتبة المركزبة الجديدة - جامعة القاهرة	Cai01.13.06.M.Sc.2013.Is.D (Browse shelf(Opens below))	61021.CD	Not for loan		01020110061021000

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Thesis (M.Sc.) - Cairo University - Faculty of Engineering - Department of Computer Engineering

Double patterning lithography (DPL) is seen as one of the most promising solutions for new technology nodes such as 32nm and 22nm . However DPL faces the challenges of handling conflicts in layout decomposition and overlay errors . Currently most DPL solutions use post-layout decomposition that requires multiple iterations and designer intervention to achieve a decomposable layout as designs scale larger

Issued also as CD

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