TY  - BOOK
AU  - Islam Shaker Abdullah Abed
AU  - Amr Galal Eldin Ahmed Wassal , 
AU  - Elsayed Eissa Hemayed , 
TI  - Double - patterning friendly grid-based routing with online conflict resolution / 
PY  - 2013///
CY  - Cairo : 
PB  - Islam Shaker Abdullah Abed , 
KW  - Detailed routing
KW  - Double patterning lithography
KW  - Grid- based
N1  - Thesis (M.Sc.) - Cairo University - Faculty of Engineering - Department of Computer Engineering; Issued also as CD
N2  - Double patterning lithography (DPL) is seen as one of the most promising solutions for new technology nodes such as 32nm and 22nm . However DPL faces the challenges of handling conflicts in layout decomposition and overlay errors . Currently most DPL solutions use post-layout decomposition that requires multiple iterations and designer intervention to achieve a decomposable layout as designs scale larger
ER  -