000 01502cam a2200289 a 4500
003 EG-GiCUC
005 20250223031025.0
008 140813s2012 ua f m 000 0 eng d
040 _aEG-GiCUC
_beng
_cEG-GiCUC
041 0 _aeng
049 _aGift
097 _aM.Sc
099 _aCai01.34.M.Sc.2012.Ya.I
100 0 _aYasmine Abdelrahman Elogail
245 1 0 _aInvestigation of N - channel Si / SiGe modulation doped field effect transistor with the help of capacitance voltage measurement /
_cYasmine Abdelrahman Elogail ; Supervised Erich Kasper , Frank Gunzer , Ahmed Shaker
260 _aCairo :
_bYasmine Abdelrahman Elogail ,
_c2012
300 _a177 Leaves ;
_c30cm
502 _aThesis (M.Sc.) - German University - Faculty of Postgraduate Studies and Scientific Research - Department of Electronics
520 _aThis work is concerned with devices based on suained Si / SiGe heterostructures, specifically the N - channel Si / SiGe modulation doped field effect transistor (MODFET). The heterostructures are important building blocks of modern microelectronic devices because carrier channels can be strained which results in higher mobility and carrier channels can buried which results in reduced interface scattering
700 0 _aAhmed Shaker ,
_eSupervisor
700 0 _aErich Kasper ,
_eSupervisor
700 0 _aFrank Gunzer ,
_eSupervisor
856 _uhttp://172.23.153.220/th.pdf
905 _aNazla
_eRevisor
905 _aSamia
_eCataloger
942 _2ddc
_cTH
999 _c46847
_d46847