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Study of the physical properties of the semiconductor polymer thin films prepared by plasma enhanced chemical vapor deposition / Tareq M.J.Ashour ; Supervised Lotfi Z.Ismail , M.Salah Eldessouki , Magdy M.Omar

By: Contributor(s): Language: Eng Publication details: Cairo : Tareq Mohamed Jamel Ashour , 2008Description: 84Leaves : charts , facsimiles ; 30cmOther title:
  • دراسة الخواص الفيزيائية للأغشية الرقيقة المكونة من اشباه الموصلات البوليمر المحضرة باستخدام عملية التبخير الكيميائى المعززة بالبلازما [Added title page title]
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Dissertation note: Thesis (Ph.D.) - Cairo University - Faculty Of Science - Department Of Physics Summary: The present work aims to produce semiconductor thin film using low - pressure microwave plasma chemical vapor deposition (LPMP - CVD) techique.This deposition has been done by constructing a special geometrical arrangement for sample boat and substrate inside the microwave plasma chamber
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Item type Current library Home library Call number Copy number Status Barcode
Thesis Thesis قاعة الرسائل الجامعية - الدور الاول المكتبة المركزبة الجديدة - جامعة القاهرة Cai01.12.20.Ph.D.2008.Ta.S (Browse shelf(Opens below)) Not for loan 01010110049773000
CD - Rom CD - Rom مخـــزن الرســائل الجـــامعية - البدروم المكتبة المركزبة الجديدة - جامعة القاهرة Cai01.12.20.Ph.D.2008.Ta.S (Browse shelf(Opens below)) 49773.CD Not for loan 01020110049773000

Thesis (Ph.D.) - Cairo University - Faculty Of Science - Department Of Physics

The present work aims to produce semiconductor thin film using low - pressure microwave plasma chemical vapor deposition (LPMP - CVD) techique.This deposition has been done by constructing a special geometrical arrangement for sample boat and substrate inside the microwave plasma chamber

Issued also as CD

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